Sputtering Targets
 
 

Magnetron Sputtering Coating is a new type of physical vapor deposition (PVD), using electron gun system to emit electrons and focus on the plated materials, and the sputtered atoms following the momentum conversion principle with a higher kinetic energy flying away from the plated materials to substrates deposit and form films. The plated materials are called sputtering targets.

Sputtering targets are more demanding than traditional material. General requirements are such as size, flatness, purity, various impurities contents, density, N/O/C/S, grain size and defect control, etc.

Higher or special requirements include surface roughness, resistance, grain size uniformity, composition and organization uniformity, foreign matter (oxide) content and size, magnetic conductivity, ultra-high density, ultra-fine grain and so on.

Cr target
  • Purity: 99.8%, 99.95%
  • Using hot isostatic pressing(HIP) process, coating material of even ingredient
  • High-purity, wear-resistant, friction-reduciing, corrosion-resistant and self-lubricating metal target
  • Advantage: even ingredient, high density, low gas content, etc.
  • Colors with high gloss
  • Can be used to produce ordinary black film(from light to dark black), silver film, hard film, DLC film, etc.
Ti target
  • High compactness
  • Low gas content
  • Form film evenly during coating process
  • Film with good corrosion and abrasion resistance
  • Colors with high gloss
  • Can be used to prepare decorative and functional (tool, etc.) TiN film, imitation gold film, ordinary black film, rose gold film and so on
Si target
  • Using advanced miscellaneous forming craft
  • Si target: high purity and low resistane<0.02Ω
  • Unique Bonding treatment
  • Excellent heat dissipation&easy to use to avoid the high cost and poor performance of metallization by sputtering
  • Mainly used in flat display, touch screen, waterproof&anti-fingerprint
  • Improve film hardness and gloss
Nb target
  • High purity and density
  • High compactness
  • Short lead times and easy to use
  • Mainly used for strong acid and alkali corrosion resistance film
NiCr target
  • Alloy ratio: 80%:20%
  • High purity, 99.9%
  • Strong anti-corrosion performance
  • Widely used in tools and decorative coating, PET sheet
  • Including gold, silver, black and color series
Ta target
  • High purity and density
  • High compactness
  • Short lead times & easy to use
Si+Cu composite target
  • Using advanced miscellaneous forming process
  • Si target: high purity and low resistane<0.02Ω
  • Application of silicon target with unique Bonding treatment
  • Excellent heat dissipation & easy to use
Multi-arc chromium silicon target
  • Mainly used for decorative coating to improve film hardness and gloss
  • Main film colors are black, silver, etc.





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